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Positionally dependent 15 N fractionation factors in the UV photolysis of N 2 O determined by high resolution FTIR spectroscopy
Author(s) -
Turatti F.,
Griffith D. W. T.,
Wilson S. R.,
Esler M. B.,
Rahn T.,
Zhang H.,
Blake G. A.
Publication year - 2000
Publication title -
geophysical research letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.007
H-Index - 273
eISSN - 1944-8007
pISSN - 0094-8276
DOI - 10.1029/2000gl011371
Subject(s) - photodissociation , fractionation , isotopomers , spectroscopy , analytical chemistry (journal) , fourier transform infrared spectroscopy , resolution (logic) , chemistry , wavelength , materials science , photochemistry , physics , optics , chromatography , molecule , optoelectronics , organic chemistry , quantum mechanics , artificial intelligence , computer science
Positionally dependent fractionation factors for the photolysis of isotopomers of N 2 O in natural abundance have been determined by high resolution FTIR spectroscopy at three photolysis wavelengths. Fractionation factors show clear 15 N position and photolysis wavelength dependence and are in qualitative agreement with theoretical models but are twice as large. The fractionation factors increase with photolysis wavelength from 193 to 211 nm, with the fractionation factors at 207.6 nm for 14 N 15 N 16 O, 15 N 14 N 16 O and 14 N 14 N 18 O equal to −66.5±5‰,−27.1±6‰ and −49±10‰, respectively.