Electronic Transport Properties of Epitaxial Si/SiGe Heterostructures Grown on Single-Crystal SiGe Nanomembranes
Author(s) -
Yize Stephanie Li,
Pornsatit Sookchoo,
Xiaorui Cui,
Robert Mohr,
D. E. Savage,
Ryan H. Foote,
RB Jacobson,
Jose Sanchez-Perez,
Deborah M. Paskiewicz,
Xian Wu,
Daniel R. Ward,
S. N. Coppersmith,
M. A. Eriksson,
M. G. Lagally
Publication year - 2015
Publication title -
acs nano
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.554
H-Index - 382
eISSN - 1936-086X
pISSN - 1936-0851
DOI - 10.1021/nn506475z
Subject(s) - heterojunction , materials science , electron mobility , optoelectronics , hall effect , epitaxy , scattering , condensed matter physics , quantum hall effect , crystal (programming language) , electron , nanotechnology , electrical resistivity and conductivity , optics , physics , layer (electronics) , quantum mechanics , computer science , programming language
To assess possible improvements in the electronic performance of two-dimensional electron gases (2DEGs) in silicon, SiGe/Si/SiGe heterostructures are grown on fully elastically relaxed single-crystal SiGe nanomembranes produced through a strain engineering approach. This procedure eliminates the formation of dislocations in the heterostructure. Top-gated Hall bar devices are fabricated to enable magnetoresistivity and Hall effect measurements. Both Shubnikov-de Haas oscillations and the quantum Hall effect are observed at low temperatures, demonstrating the formation of high-quality 2DEGs. Values of charge carrier mobility as a function of carrier density extracted from these measurements are at least as high or higher than those obtained from companion measurements made on heterostructures grown on conventional strain graded substrates. In all samples, impurity scattering appears to limit the mobility.
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