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Type- and Species-Selective Air Etching of Single-Walled Carbon Nanotubes Tracked with in Situ Raman Spectroscopy
Author(s) -
Andrew Li-Pook-Than,
J. Lefebvre,
Paul Finnie
Publication year - 2013
Publication title -
acs nano
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 5.554
H-Index - 382
eISSN - 1936-086X
pISSN - 1936-0851
DOI - 10.1021/nn402412t
Subject(s) - raman spectroscopy , carbon nanotube , etching (microfabrication) , materials science , in situ , nanotube , thermal oxidation , spectroscopy , nanotechnology , thermal , analytical chemistry (journal) , molecular physics , optoelectronics , chemistry , optics , organic chemistry , physics , layer (electronics) , quantum mechanics , meteorology
The thermal oxidation of carbon nanotubes in air is investigated by in situ Raman spectroscopy. Etching rates are directly seen to be diameter, chirality, and type dependent. We directly track the evolution of bundled nanotube networks that undergo air etching from 300 to 600 °C. Some species are more robust than others. Changes to radial breathing mode (RBM) and G- peak structures suggest that metallic species etch away more rapidly, with smaller diameter semiconducting species etching more slowly and large diameter nanotubes, including semiconductors, etching last. The decay in integrated G and D band intensities is tracked and fit reasonably well with biexponential decay. The RBM evolution is better represented by a single exponential. All bands are fit to activation plots with RBMs showing significantly different rates.

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