A Study of Simultaneous Patterning and Alignment of Semiconductor Nanorods via Polymerization-Induced Phase Separation | Zendy

Jesse Greener | Zendy; Tibert Hendrik van der Loop | Zendy; Chantal Paquet | Zendy; Gregory D. Scholes | Zendy; Eugenia Kumacheva | Zendy

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A Study of Simultaneous Patterning and Alignment of Semiconductor Nanorods via Polymerization-Induced Phase Separation

Author(s) -

Jesse Greener,

Tibert Hendrik van der Loop,

Chantal Paquet,

Gregory D. Scholes,

Eugenia Kumacheva

Publication year - 2009

Publication title -

langmuir

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.042

H-Index - 333

eISSN - 1520-5827

pISSN - 0743-7463

DOI - 10.1021/la803521t

Subject(s) - nanorod , semiconductor , polymerization , materials science , nanotechnology , phase (matter) , separation (statistics) , optoelectronics , chemical engineering , polymer , chemistry , composite material , organic chemistry , engineering , machine learning , computer science

We report simultaneous patterning and alignment of semiconductor nanorods (NRs) in nanorod-polymer films by using photolithographic polymerization-induced phase separation (PIPS). Exposure of the nanoparticle-monomer mixture to UV irradiation through a mask resulted in the site-specific photoinitiated polymerization of the monomer, which was followed with flow of the NRs from the areas rich in polymer to the areas rich in monomer. The orientation of NRs in the direction of flow was trapped in the polymerized films and characterized in polarization absorption experiments.

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