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Photochemically Generated Thiyl Free Radicals Observed by X-ray Absorption Spectroscopy
Author(s) -
Eileen Yu Sneeden,
Mark J. Hackett,
Julien J. H. Cotelesage,
Roger C. Prince,
Monica Barney,
Kei Goto,
Eric Block,
Ingrid J. Pickering,
Graham N. George
Publication year - 2017
Publication title -
journal of the american chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 7.115
H-Index - 612
eISSN - 1520-5126
pISSN - 0002-7863
DOI - 10.1021/jacs.7b05116
Subject(s) - chemistry , radical , sulfur , absorption spectroscopy , photochemistry , spectroscopy , absorption (acoustics) , spectral line , irradiation , x ray absorption spectroscopy , k edge , absorption edge , x ray , organic chemistry , optics , band gap , physics , quantum mechanics , astronomy , nuclear physics
Sulfur-based thiyl radicals are known to be involved in a wide range of chemical and biological processes, but they are often highly reactive, which makes them difficult to observe directly. We report herein X-ray absorption spectra and analysis that support the direct observation of two different thiyl species generated photochemically by X-ray irradiation. The thiyl radical sulfur K-edge X-ray absorption spectra of both species are characterized by a uniquely low energy transition at about 2465 eV, which occurs at a lower energy than any previously observed feature at the sulfur K-edge and corresponds to a 1s→3p transition to the singly occupied molecular orbital of the free radical. Our results constitute the first observation of substantial levels of thiyl radicals generated by X-ray irradiation and detected by sulfur K-edge X-ray absorption spectroscopy.

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