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Regioselective Atomic Layer Deposition in Metal–Organic Frameworks Directed by Dispersion Interactions
Author(s) -
Leighanne C. Gallington,
In S. Kim,
Wei-Guang Liu,
Andrey A. Yakovenko,
Ana E. PlateroPrats,
Zhanyong Li,
Timothy C. Wang,
Joseph T. Hupp,
Omar K. Farha,
Donald G. Truhlar,
Alex B. F. Martinson,
Karena W. Chapman
Publication year - 2016
Publication title -
journal of the american chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 7.115
H-Index - 612
eISSN - 1520-5126
pISSN - 0002-7863
DOI - 10.1021/jacs.6b08711
Subject(s) - atomic layer deposition , regioselectivity , chemistry , metal organic framework , deposition (geology) , dispersion (optics) , adsorption , metal , synchrotron , nanotechnology , group 2 organometallic chemistry , density functional theory , layer (electronics) , chemical engineering , inorganic chemistry , molecule , computational chemistry , organic chemistry , catalysis , materials science , paleontology , physics , sediment , nuclear physics , optics , biology , engineering
The application of atomic layer deposition (ALD) to metal-organic frameworks (MOFs) offers a promising new approach to synthesize designer functional materials with atomic precision. While ALD on flat substrates is well established, the complexity of the pore architecture and surface chemistry in MOFs present new challenges. Through in situ synchrotron X-ray powder diffraction, we visualize how the deposited atoms are localized and redistribute within the MOF during ALD. We demonstrate that the ALD is regioselective, with preferential deposition of oxy-Zn(II) species within the small pores of NU-1000. Complementary density functional calculations indicate that this startling regioselectivity is driven by dispersion interactions associated with the preferential adsorption sites for the organometallic precursors prior to reaction.

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