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Radical Activation of N–H and O–H Bonds at Bismuth(II)
Author(s) -
Xiuxiu Yang,
Edward J. Reijerse,
Kalishankar Bhattacharyya,
Markus Leutzsch,
Markus Kochius,
Nils Nöthling,
Julia Busch,
Alexander Schnegg,
Alexander A. Auer,
Josep Cornellà
Publication year - 2022
Publication title -
journal of the american chemical society
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 7.115
H-Index - 612
eISSN - 1520-5126
pISSN - 0002-7863
DOI - 10.1021/jacs.2c05882
Subject(s) - chemistry , bismuth , reactivity (psychology) , ammonia , alkoxy group , medicinal chemistry , stereochemistry , photochemistry , organic chemistry , alkyl , medicine , alternative medicine , pathology

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