Open AccessQuantitative Analysis and Optimization of Gravure Printed Metal Ink, Dielectric, and Organic Semiconductor Films
Author(s) -
Stuart G. Higgins,
Chess Boughey,
Russell Hills,
Joachim H. G. Steinke,
Beinn V. O. Muir,
Alasdair J. Campbell
Publication year - 2015
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/am508316f
Subject(s) - materials science , homogeneity (statistics) , inkwell , screen printing , printed electronics , semiconductor , dielectric , optoelectronics , scanner , organic semiconductor , 3d printed , optics , composite material , computer science , machine learning , medicine , biomedical engineering , physics
Here we demonstrate the optimization of gravure printed metal ink, dielectric, and semiconductor formulations. We present a technique for nondestructively imaging printed films using a commercially available flatbed scanner, combined with image analysis to quantify print behavior. Print speed, cliché screen density, nip pressure, the orientation of print structures, and doctor blade extension were found to have a significant impact on the quality of printed films, as characterized by the spreading of printed structures and variation in print homogeneity. Organic semiconductor prints were observed to exhibit multiple periodic modulations, which are correlated to the underlying cell structure.