Open AccessUnraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF4/H2 Plasma Reactive-Ion Etching
Author(s) -
F. Ghezzi,
Matteo Pedroni,
Janez Kovač,
Federica Causa,
A. Cremona,
M. Anderle,
R. Caniello,
Silvia Maria Pietralunga,
E. Vassallo
Publication year - 2022
Publication title -
acs omega
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.779
H-Index - 40
ISSN - 2470-1343
DOI - 10.1021/acsomega.2c02740
Subject(s) - reactive ion etching , black silicon , etching (microfabrication) , nanopillar , silicon , materials science , plasma etching , nanotechnology , sputtering , plasma , nanostructure , optoelectronics , layer (electronics) , thin film , physics , quantum mechanics
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