Open AccessGiant Magnetoresistance in a Chemical Vapor Deposition Graphene Constriction
Author(s) -
L. W. Smith,
J. Batey,
Jack A. AlexanderWebber,
Yu-Chiang Hsieh,
Shin-Jr Fung,
Tom AlbrowOwen,
Harvey E. Beere,
Oliver J. Burton,
Stephan Hofmann,
D. A. Ritchie,
Michael J. Kelly,
TseMing Chen,
Hannah J. Joyce,
C. G. Smith
Publication year - 2022
Publication title -
acs nano
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 5.554
H-Index - 382
eISSN - 1936-086X
pISSN - 1936-0851
DOI - 10.1021/acsnano.1c09815
Subject(s) - materials science , graphene , chemical vapor deposition , quantum tunnelling , magnetoresistance , condensed matter physics , biasing , magnetic field , magnetization , nanotechnology , optoelectronics , voltage , electrical engineering , physics , engineering , quantum mechanics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom