Nanoporous Dielectric Resistive Memories Using Sequential Infiltration Synthesis
Author(s) -
Bhaswar Chakrabarti,
Henry Chan,
Khan Alam,
Aditya Koneru,
Thomas E. Gage,
Leonidas E. Ocola,
Ralu Divan,
Daniel Rosenmann,
Abhishek Khanna,
Benjamin Grisafe,
Toby Sanders,
Suman Datta,
Ilke Arslan,
Subramanian K. R. S. Sankaranarayan,
Supratik Guha
Publication year - 2021
Publication title -
acs nano
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 5.554
H-Index - 382
eISSN - 1936-086X
pISSN - 1936-0851
DOI - 10.1021/acsnano.0c03201
Subject(s) - materials science , nanoporous , atomic layer deposition , neuromorphic engineering , dielectric , optoelectronics , nanotechnology , resistive random access memory , non volatile memory , leakage (economics) , voltage , thin film , computer science , electrical engineering , engineering , machine learning , artificial neural network , economics , macroeconomics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom