Open AccessLarge-Scale Soft-Lithographic Patterning of Plasmonic Nanoparticles
Author(s) -
Naihao Chiang,
Leonardo Scarabelli,
Gail A. VinnacombeWillson,
Luis Alberto Pérez,
Camilla Dore,
Agustín Mihi,
Steven J. Jonas,
Paul S. Weiss
Publication year - 2021
Publication title -
acs materials letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.662
H-Index - 12
ISSN - 2639-4979
DOI - 10.1021/acsmaterialslett.0c00535
Subject(s) - nanotechnology , plasmon , materials science , lithography , nanoscopic scale , soft lithography , nanoparticle , subtractive color , polydimethylsiloxane , colloidal gold , plasmonic nanoparticles , fabrication , optoelectronics , optics , medicine , alternative medicine , physics , pathology
Micro- and nanoscale patterned monolayers of plasmonic nanoparticles were fabricated by combining concepts from colloidal chemistry, self-assembly, and subtractive soft lithography. Leveraging chemical interactions between the capping ligands of pre-synthesized gold colloids and a polydimethylsiloxane stamp, we demonstrated patterning gold nanoparticles over centimeter-scale areas with a variety of micro- and nanoscale geometries, including islands, lines, and chiral structures ( e.g., square spirals). By successfully achieving nanoscale manipulation over a wide range of substrates and patterns, we establish a powerful and straightforward strategy, nanoparticle chemical lift-off lithography (NP-CLL), for the economical and scalable fabrication of functional plasmonic materials with colloidal nanoparticles as building blocks, offering a transformative solution for designing next-generation plasmonic technologies.