Open AccessChemical Passivation of Crystalline Si by Al2O3 Deposited Using Atomic Layer Deposition: Implications for Solar Cells
Author(s) -
Abigail R. Meyer,
Rohan P. Chaukulkar,
Noémi Leick,
William Nemeth,
David L. Young,
Paul Stradins,
Sumit Agarwal
Publication year - 2021
Publication title -
acs applied nano materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.227
H-Index - 29
ISSN - 2574-0970
DOI - 10.1021/acsanm.1c00448
Subject(s) - passivation , annealing (glass) , atomic layer deposition , materials science , analytical chemistry (journal) , silicon , crystalline silicon , fourier transform infrared spectroscopy , infrared spectroscopy , thin film , chemical engineering , layer (electronics) , nanotechnology , optoelectronics , chemistry , metallurgy , organic chemistry , chromatography , engineering
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