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Accumulative Polarization Reversal in Nanoscale Ferroelectric Transistors
Author(s) -
Halid Mulaosmanovic,
Thomas Mikolajick,
Stefan Slesazeck
Publication year - 2018
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.8b08967
Subject(s) - ferroelectricity , materials science , optoelectronics , non volatile memory , transistor , ferroelectric ram , nanoscopic scale , polarization (electrochemistry) , nanotechnology , ferroelectric capacitor , field effect transistor , nanoelectronics , nucleation , voltage , dielectric , electrical engineering , chemistry , organic chemistry , engineering
The electric-field-driven and reversible polarization switching in ferroelectric materials provides a promising approach for nonvolatile information storage. With the advent of ferroelectricity in hafnium oxide, it has become possible to fabricate ultrathin ferroelectric films suitable for nanoscale electronic devices. Among them, ferroelectric field-effect transistors (FeFETs) emerge as attractive memory elements. While the binary switching between the two logic states, accomplished through a single voltage pulse, is mainly being investigated in FeFETs, additional and unusual switching mechanisms remain largely unexplored. In this work, we report the natural property of ferroelectric hafnium oxide, embedded within a nanoscale FeFET, to accumulate electrical excitation, followed by a sudden and complete switching. The accumulation is attributed to the progressive polarization reversal through localized ferroelectric nucleation. The electrical experiments reveal a strong field and time dependence of the phenomenon. These results not only offer novel insights that could prove critical for memory applications but also might inspire to exploit FeFETs for unconventional computing.

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