Scanning Probe Photonic Nanojet Lithography

The use of nano/microspheres or beads for optical nanolithography is a consolidated technique for achieving subwavelength structures using a cost-effective approach; this method exploits the capability of the beads to focus electromagnetic waves into subwavelength beams called photonic nanojets, which are used to expose the photoresist on which the beads are placed. However, this technique has only been used to produce regular patterns based on the spatial arrangement of the beads on the substrate, thus considerably limiting the pool of applications. Here, we present a novel microsphere-based optical lithography technique that offers high subwavelength resolution and the possibility of generating any arbitrary pattern. The presented method consists of a single microsphere embedded in an AFM cantilever, which can be controlled using the AFM motors to write arbitrary patterns with subwavelength resolution (down to 290 nm with a 405 nm laser). The performance of the proposed technique can compete with those of commercial high-resolution standard instruments, with the advantage of a one-order-of-magnitude reduction in costs. This approach paves the way for direct integration of cost-effective, high-resolution optical lithography capabilities into several existing AFM systems.