Organic Field-Effect Transistors with a Bilayer Gate Dielectric Comprising an Oxide Nanolaminate Grown by Atomic Layer Deposition
Author(s) -
Cheng-Yin Wang,
Canek Fuentes-Hernández,
Minseong Yun,
Ankit Kumar Singh,
Amir Dindar,
Sangmoo Choi,
Samuel Graham,
Bernard Kippelen
Publication year - 2016
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.6b10603
Subject(s) - materials science , atomic layer deposition , bilayer , layer (electronics) , field effect transistor , optoelectronics , dielectric , deposition (geology) , gate dielectric , nanotechnology , thin film transistor , oxide , high κ dielectric , transistor , voltage , metallurgy , electrical engineering , paleontology , engineering , membrane , sediment , biology , genetics
We report on top-gate OFETs with a bilayer gate dielectric comprising an Al 2 O 3 /HfO 2 nanolaminate layer grown by atomic layer deposition and an amorphous fluoro-polymer layer (CYTOP). Top-gate OFETs display average carrier mobility values of 0.9 ± 0.2 cm 2 /(V s) and threshold voltage values of -1.9 ± 0.5 V and high operational and environmental stability under different environmental conditions such as damp air at 50 °C (80% relative humidity) and prolonged immersion in water at a temperature up to 95 °C.
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