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Attenuation of Photoelectron Emission by a Single Organic Layer
Author(s) -
Thorsten Wagner,
Graż̇yna Antczak,
Michael Györök,
Agata Sabik,
Anna Volokitina,
F. Gołek,
P. Zeppenfeld
Publication year - 2022
Publication title -
acs applied materials and interfaces
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.535
H-Index - 228
eISSN - 1944-8252
pISSN - 1944-8244
DOI - 10.1021/acsami.2c02996
Subject(s) - materials science , work function , monolayer , mean free path , electron , phthalocyanine , cobalt , layer (electronics) , inelastic mean free path , x ray photoelectron spectroscopy , analytical chemistry (journal) , nanotechnology , nuclear magnetic resonance , chemistry , physics , metallurgy , quantum mechanics , chromatography
We report an in situ study of the thin-film growth of cobalt-phthalocyanine on Ag(100) surfaces using photoelectron emission microscopy (PEEM) and the Anderson method. Based on the Fowler-DuBridge theory, we were able to correlate the evolution of the mean electron yield acquired with PEEM for coverages up to two molecular layers of cobalt-phthalocyanine to the global work function changes measured with the Anderson method. For coverages above two monolayers, the transients measured with the Anderson method and those obtained with PEEM show different trends. We exploit this discrepancy to determine the inelastic mean free path of the low-energy electrons while passing through the third layer of CoPc.

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