Open AccessRealizing the Potential of RF-Sputtered Hydrogenated Fluorine-Doped Indium Oxide as an Electrode Material for Ultrathin SiOx/Poly-Si Passivating Contacts
Author(s) -
Can Han,
Guangtao Yang,
Ana Montes,
Paul Procel,
Luana Mazzarella,
Yifeng Zhao,
S.W.H. Eijt,
H. Schut,
Xiaodan Zhang,
Miro Zeman,
Olindo Isabella
Publication year - 2020
Publication title -
acs applied energy materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.833
H-Index - 36
ISSN - 2574-0962
DOI - 10.1021/acsaem.0c01206
Subject(s) - materials science , passivation , indium , doping , optoelectronics , annealing (glass) , electron mobility , solar cell , oxide , hydrogen , silicon , chemical vapor deposition , chemical engineering , nanotechnology , layer (electronics) , composite material , metallurgy , chemistry , organic chemistry , engineering
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