Influence of Metal Substitution and Ion Energy on Microstructure Evolution of High-Entropy Nitride (TiZrTaMe)N1–x (Me = Hf, Nb, Mo, or Cr) Films
Author(s) -
Rui Shu,
Daniel Lundin,
Binbin Xin,
Maurício A. Sortica,
Daniel Primetzhofer,
Martin Magnuson,
Arnaud le Febvrier,
Per Eklund
Publication year - 2021
Publication title -
acs applied electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.379
H-Index - 4
ISSN - 2637-6113
DOI - 10.1021/acsaelm.1c00311
Subject(s) - elastic recoil detection , materials science , crystallite , microstructure , biasing , sputter deposition , thin film , sputtering , nitride , analytical chemistry (journal) , substrate (aquarium) , composite material , metallurgy , nanotechnology , layer (electronics) , chemistry , voltage , physics , quantum mechanics , chromatography , oceanography , geology
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