Open AccessThickness Limit for Alignment of Block Copolymer Films Using Solvent Vapor Annealing with Shear
Author(s) -
Chao Zhang,
Kevin A. Cavicchi,
Ruipeng Li,
Kevin G. Yager,
Masafumi Fukuto,
Bryan D. Vogt
Publication year - 2018
Publication title -
macromolecules
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.994
H-Index - 313
eISSN - 1520-5835
pISSN - 0024-9297
DOI - 10.1021/acs.macromol.8b00539
Subject(s) - materials science , polystyrene , wafer , small angle x ray scattering , copolymer , polydimethylsiloxane , composite material , annealing (glass) , scattering , thin film , contact angle , optics , nanotechnology , polymer , physics
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