z-logo
open-access-imgOpen Access
Poly(dimethylsiloxane-b-methyl methacrylate): A Promising Candidate for Sub-10 nm Patterning
Author(s) -
Yingdong Luo,
Damien Montarnal,
Sangwon Kim,
Weichao Shi,
Katherine P. Barteau,
Christian W. Pester,
Phillip D. Hustad,
Matthew D. Christianson,
Glenn H. Fredrickson,
Edward J. Krämer,
Craig J. Hawker
Publication year - 2015
Publication title -
macromolecules
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.994
H-Index - 313
eISSN - 1520-5835
pISSN - 0024-9297
DOI - 10.1021/acs.macromol.5b00518
Subject(s) - methyl methacrylate , methacrylate , polymer chemistry , materials science , copolymer , poly(methyl methacrylate) , polymer science , chemical engineering , polymer , chemistry , composite material , engineering

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom