Open AccessHole, Convex, and Silver Nanoparticle Patterning on Polystyrene Nanosheets by Colloidal Photolithography at Air–Water Interfaces
Author(s) -
Rino Kaneko,
Hiroto Ichikawa,
Marika Hosaka,
Yoshihiro Sone,
Yoshiro Imura,
KeHsuan Wang,
Takeshi Kawai
Publication year - 2022
Publication title -
langmuir
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.042
H-Index - 333
eISSN - 1520-5827
pISSN - 0743-7463
DOI - 10.1021/acs.langmuir.2c01069
Subject(s) - photoresist , photolithography , polystyrene , materials science , colloid , polymer , nanotechnology , nanoparticle , dissolution , chemical engineering , ultraviolet , ultraviolet light , lithography , optoelectronics , composite material , layer (electronics) , engineering
Colloidal photolithography is a versatile advanced technique for fabricating periodic nanopatterned arrays, with patterns carved exclusively on photoresist films deposited on solid substrates in a typical photolithographic process. In this study, we apply colloidal photolithography to polystyrene (PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids at the air-water interface and demonstrate that periodic hole structures can be carved in PS films by two processes: photodecomposing PS films with ultraviolet (UV) light and removing PMMA colloids with a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral comma-shaped holes, are also fabricated by regulating the UV illumination conditions. Furthermore, in addition to holes, convex patterns on PS films are realized by combining weak UV illumination with solvent treatment. We also demonstrate that actively using the water surface as the UV illumination field enables periodic silver nanoparticle spots to be deposited on PS films simply by dissolving silver ions in the water phase.