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Contact Metal–MoS2 Interfacial Reactions and Potential Implications on MoS2-Based Device Performance
Author(s) -
Christopher M. Smyth,
Rafik Addou,
Stephen McDonnell,
Christopher L. Hinkle,
Robert M. Wallace
Publication year - 2016
Publication title -
journal of physical chemistry. c./journal of physical chemistry. c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.6b04473
Subject(s) - work function , metal , deposition (geology) , ultra high vacuum , contact angle , contact resistance , materials science , thin film , chemistry , analytical chemistry (journal) , chemical engineering , nanotechnology , metallurgy , composite material , layer (electronics) , organic chemistry , paleontology , engineering , sediment , biology

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