Open AccessSurface Structures from NH3 Chemisorption in CVD and ALD of AlN, GaN, and InN Films
Author(s) -
Karl Rönnby,
Henrik Pedersen,
Lars Ojamäe
Publication year - 2022
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.401
H-Index - 289
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.2c00510
Subject(s) - materials science , atomic layer deposition , indium nitride , chemical vapor deposition , nitride , gallium nitride , aluminium nitride , thin film , indium , nanotechnology , optoelectronics , aluminium , layer (electronics) , composite material
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom