Local Structure Properties of Hydrogenated and Nonhydrogenated Amorphous In–Ga–Zn–O Thin Films Using XAFS and High-Energy XRD | Zendy

L. S. R. Kumara | Zendy; Kyohei Ishikawa | Zendy; Keisuke Ide | Zendy; Hideo Hosono | Zendy; Toshio Kamiya | Zendy; Osami Sakata | Zendy

Open Access

Local Structure Properties of Hydrogenated and Nonhydrogenated Amorphous In–Ga–Zn–O Thin Films Using XAFS and High-Energy XRD

Author(s) -

L. S. R. Kumara,

Kyohei Ishikawa,

Keisuke Ide,

Hideo Hosono,

Toshio Kamiya,

Osami Sakata

Publication year - 2021

Publication title -

the journal of physical chemistry c

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.401

H-Index - 289

eISSN - 1932-7455

pISSN - 1932-7447

DOI - 10.1021/acs.jpcc.1c02437

Subject(s) - x ray absorption fine structure , amorphous solid , materials science , impurity , sputtering , fermi level , electronic structure , thin film transistor , hydrogen , atomic units , thin film , analytical chemistry (journal) , reverse monte carlo , extended x ray absorption fine structure , absorption spectroscopy , atomic physics , spectroscopy , crystallography , chemistry , nanotechnology , crystal structure , optics , layer (electronics) , computational chemistry , neutron diffraction , physics , organic chemistry , quantum mechanics , chromatography , electron

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