Open AccessCorrection to “Atomic Layer Deposition of Aluminum Phosphate Using AlMe3, PO(OMe)3, and O2 Plasma: Film Growth and Surface Reactions”
Author(s) -
N. Hornsveld,
W. M. M. Kessels,
Mariadriana Creatore
Publication year - 2020
Publication title -
the journal of physical chemistry c
Language(s) - English
Resource type - Journals
eISSN - 1932-7455
pISSN - 1932-7447
DOI - 10.1021/acs.jpcc.0c10011
Subject(s) - atomic layer deposition , notice , citation , social media , altmetrics , nanotechnology , computer science , analytical chemistry (journal) , chemistry , library science , layer (electronics) , world wide web , materials science , political science , environmental chemistry , law
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