Sequential Infiltration Synthesis of Electronic Materials: Group 13 Oxides via Metal Alkyl Precursors
Author(s) -
Ruben Z. Waldman,
Nari Jeon,
David J. Mandia,
Olle Hein,
Seth B. Darling,
Alex B. F. Martinson
Publication year - 2019
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.9b01714
Subject(s) - trimethylindium , trimethylgallium , alkyl , fourier transform infrared spectroscopy , materials science , indium , thin film , gallium , chemical engineering , chemistry , analytical chemistry (journal) , polymer chemistry , inorganic chemistry , organic chemistry , nanotechnology , metalorganic vapour phase epitaxy , layer (electronics) , epitaxy , engineering , metallurgy
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