Open AccessSelf-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO)3 and Water
Author(s) -
Zhengning Gao,
Duy Le,
Asim Khaniya,
Charles L. Dezelah,
Jacob Woodruff,
Ravindra K. Kanjolia,
William E. Kaden,
Talat S. Rahman,
Parag Banerjee
Publication year - 2019
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.8b04456
Subject(s) - ruthenium , atomic layer deposition , x ray photoelectron spectroscopy , catalysis , nucleation , chemistry , dissociation (chemistry) , analytical chemistry (journal) , inorganic chemistry , materials science , layer (electronics) , chemical engineering , organic chemistry , engineering
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