Open AccessNucleation Enhancement and Area-Selective Atomic Layer Deposition of Ruthenium Using RuO4 and H2 Gas
Author(s) -
Matthias M. Minjauw,
Hannes Rijckaert,
Isabel Van Driessche,
Christophe Detavernier,
Jolien Dendooven
Publication year - 2019
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.8b03852
Subject(s) - x ray photoelectron spectroscopy , nucleation , substrate (aquarium) , materials science , atomic layer deposition , oxide , analytical chemistry (journal) , scanning electron microscope , silicon , ruthenium , transmission electron microscopy , layer (electronics) , chemical engineering , chemistry , nanotechnology , optoelectronics , organic chemistry , metallurgy , oceanography , composite material , engineering , geology , catalysis
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