Open AccessMechanistic Studies of Chain Termination and Monomer Absorption in Molecular Layer Deposition
Author(s) -
David S. Bergsman,
Richard G. Closser,
Stacey F. Bent
Publication year - 2018
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.8b01468
Subject(s) - monomer , polyurea , absorption (acoustics) , chain termination , adsorption , deposition (geology) , layer (electronics) , chain (unit) , materials science , work (physics) , chain propagation , chemistry , chemical engineering , polymer chemistry , chemical physics , polymer , organic chemistry , nanotechnology , thermodynamics , composite material , paleontology , physics , radical polymerization , astronomy , sediment , engineering , biology , coating
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