Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition | Zendy

Raphaël Boichot | Zendy; Liang Tian | Zendy; MarieIngrid Richard | Zendy; Alexandre Crisci | Zendy; A. Chaker | Zendy; V. Cantelli | Zendy; S. Coindeau | Zendy; S. Lay | Zendy; T. Ouled | Zendy; C. Guichet | Zendy; Chu Manh Hung | Zendy; Nicolas Aubert | Zendy; G. Ciatto | Zendy; E. Blanquet | Zendy; Ο. Thomas | Zendy; JeanLuc Deschanvres | Zendy; Dillon D. Fong | Zendy; H. Renevier | Zendy

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Evolution of Crystal Structure During the Initial Stages of ZnO Atomic Layer Deposition

Author(s) -

Raphaël Boichot,

Liang Tian,

MarieIngrid Richard,

Alexandre Crisci,

A. Chaker,

V. Cantelli,

S. Coindeau,

S. Lay,

T. Ouled,

C. Guichet,

Chu Manh Hung,

Nicolas Aubert,

G. Ciatto,

E. Blanquet,

Ο. Thomas,

JeanLuc Deschanvres,

Dillon D. Fong,

H. Renevier

Publication year - 2016

Publication title -

chemistry of materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.741

H-Index - 375

eISSN - 1520-5002

pISSN - 0897-4756

DOI - 10.1021/acs.chemmater.5b04223

Subject(s) - coalescence (physics) , materials science , synchrotron , silicon , atomic layer deposition , microstructure , chemical physics , deposition (geology) , crystal structure , oxide , layer (electronics) , crystallography , chemical engineering , nanotechnology , metallurgy , chemistry , optics , geology , paleontology , physics , engineering , sediment , astrobiology

International audienceA complementary suite of in situ synchrotron X-ray techniques is used to investigate both structural and chemical evolution during ZnO growth by atomic layer deposition. Focusing on the first 10 cycles of growth, we observe that the structure formed during the coalescence stage largely determines the overall microstructure of the film. Furthermore, by comparing ZnO growth on silicon with a native oxide with that on Al2O3(001), we find that even with lattice-mismatched substrates and low deposition temperatures, the crystalline texture of the films is dependent strongly on the nature of the interfacial bonds

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