Resolving the Evolution of Atomic Layer-Deposited Thin-Film Growth by Continuous In Situ X-Ray Absorption Spectroscopy | Zendy

Xiaohui Qu | Zendy; Danhua Yan | Zendy; Ruoshui Li | Zendy; Jiajie Cen | Zendy; Chenyu Zhou | Zendy; Wenrui Zhang | Zendy; Deyu Lu | Zendy; Klaus Attenkofer | Zendy; Darı́o Stacchiola | Zendy; Mark S. Hybertsen | Zendy; Eli Stavitski | Zendy; Mingzhao Liu | Zendy

Open Access

Resolving the Evolution of Atomic Layer-Deposited Thin-Film Growth by Continuous In Situ X-Ray Absorption Spectroscopy

Author(s) -

Xiaohui Qu,

Danhua Yan,

Ruoshui Li,

Jiajie Cen,

Chenyu Zhou,

Wenrui Zhang,

Deyu Lu,

Klaus Attenkofer,

Darı́o Stacchiola,

Mark S. Hybertsen,

Eli Stavitski,

Mingzhao Liu

Publication year - 2021

Publication title -

chemistry of materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 3.741

H-Index - 375

eISSN - 1520-5002

pISSN - 0897-4756

DOI - 10.1021/acs.chemmater.0c04547

Subject(s) - atomic layer deposition , synchrotron , thin film , materials science , x ray absorption spectroscopy , in situ , absorption (acoustics) , absorption spectroscopy , characterization (materials science) , analytical chemistry (journal) , spectroscopy , growth rate , chemical physics , nanotechnology , chemistry , optics , physics , geometry , organic chemistry , mathematics , chromatography , quantum mechanics , composite material

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