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Area-Selective Deposition of Ruthenium by Area-Dependent Surface Diffusion
Author(s) -
Fabio Grillo,
Job Soethoudt,
Esteban A. Marques,
Lilian de Martín,
Kaat Van Dongen,
J. Ruud van Ommen,
Annelies Delabie
Publication year - 2020
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.0c02588
Subject(s) - surface diffusion , kinetic monte carlo , diffusion , deposition (geology) , adsorption , chemical vapor deposition , nanoparticle , nanotechnology , chemical engineering , tin , materials science , thermal diffusivity , catalysis , microelectronics , atomic layer deposition , chemical physics , chemistry , thin film , monte carlo method , organic chemistry , paleontology , physics , engineering , sediment , thermodynamics , statistics , mathematics , quantum mechanics , biology , metallurgy

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