Open AccessArea-Selective Atomic Layer Deposition of TiN Using Aromatic Inhibitor Molecules for Metal/Dielectric Selectivity
Author(s) -
Marc J. M. Merkx,
Sander Vlaanderen,
Tahsin Faraz,
Marcel A. Verheijen,
W. M. M. Kessels,
Adriaan J. M. Mackus
Publication year - 2020
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.0c02370
Subject(s) - atomic layer deposition , tin , titanium nitride , materials science , nitride , dielectric , selectivity , titanium , substrate (aquarium) , inorganic chemistry , chemical engineering , nanotechnology , analytical chemistry (journal) , chemistry , layer (electronics) , organic chemistry , optoelectronics , metallurgy , engineering , catalysis , oceanography , geology
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