Atomistic-Scale Simulations of the Graphene Growth on a Silicon Carbide Substrate Using Thermal Decomposition and Chemical Vapor Deposition
Author(s) -
Weiwei Zhang,
Adri C. T. van Duin
Publication year - 2020
Publication title -
chemistry of materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 3.741
H-Index - 375
eISSN - 1520-5002
pISSN - 0897-4756
DOI - 10.1021/acs.chemmater.0c02121
Subject(s) - reaxff , graphene , materials science , chemical vapor deposition , silicon carbide , molecular dynamics , silicon , substrate (aquarium) , nanotechnology , chemical physics , chemical engineering , computational chemistry , optoelectronics , composite material , chemistry , interatomic potential , oceanography , geology , engineering
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