Control of Surface Morphology during the Growth of (110)-Oriented GaAs by Hydride Vapor Phase Epitaxy
Author(s) -
Wondwosen Metaferia,
Anna K. Braun,
John Simon,
Corinne E. Packard,
Aaron J. Ptak,
Kevin L. Schulte
Publication year - 2021
Publication title -
crystal growth and design
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.966
H-Index - 155
eISSN - 1528-7505
pISSN - 1528-7483
DOI - 10.1021/acs.cgd.1c00235
Subject(s) - faceting , vicinal , hillock , morphology (biology) , facet (psychology) , epitaxy , materials science , substrate (aquarium) , hydride , crystallography , phase (matter) , vapor phase , growth rate , chemical physics , chemical engineering , chemistry , nanotechnology , metal , composite material , thermodynamics , geometry , metallurgy , mathematics , oceanography , engineering , biology , genetics , psychology , social psychology , layer (electronics) , big five personality traits , physics , organic chemistry , personality , geology
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