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High Useful Yield and Isotopic Analysis of Uranium by Resonance Ionization Mass Spectrometry
Author(s) -
M. R. Savina,
Brett H. Isselhardt,
A.M. Kucher,
R. Trappitsch,
B.V. King,
David G. Ruddle,
Raja Gopal,
I. D. Hutcheon
Publication year - 2017
Publication title -
analytical chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.117
H-Index - 332
eISSN - 1520-6882
pISSN - 0003-2700
DOI - 10.1021/acs.analchem.7b01204
Subject(s) - uranium oxide , chemistry , uranium , sputtering , yield (engineering) , mass spectrometry , thermal ionization , thermal ionization mass spectrometry , ionization , fast atom bombardment , analytical chemistry (journal) , oxide , static secondary ion mass spectrometry , isotopes of uranium , secondary ion mass spectrometry , ion , electron ionization , materials science , thin film , organic chemistry , chromatography , metallurgy , nanotechnology
Useful yields from resonance ionization mass spectrometry can be extremely high compared to other mass spectrometry techniques, but uranium analysis shows strong matrix effects arising from the tendency of uranium to form strongly bound oxide molecules that do not dissociate appreciably on energetic ion bombardment. We demonstrate a useful yield of 24% for metallic uranium. Modeling the laser ionization and ion transmission processes shows that the high useful yield is attributable to a high ion fraction achieved by resonance ionization. We quantify the reduction of uranium oxide surface layers by Ar + and Ga + sputtering. The useful yield for uranium atoms from a uranium dioxide matrix is 0.4% and rises to 2% when the surface is in sputter equilibrium with the ion beam. The lower useful yield from the oxide is almost entirely due to uranium oxide molecules reducing the neutral atom content of the sputtered flux. We demonstrate rapid isotopic analysis of solid uranium oxide at a precision of <0.5% relative standard deviation using relatively broadband lasers to mitigate spectroscopic fractionation.

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