Open AccessField Ion Emission in an Atom Probe Microscope Triggered by Femtosecond-Pulsed Coherent Extreme Ultraviolet Light
Author(s) -
Ann N. Chiaramonti,
Luis MiajaAvila,
Benjamin W. Caplins,
Paul T. Blanchard,
David R. Diercks,
Brian Gorman,
Norman A. Sanford
Publication year - 2020
Publication title -
microscopy and microanalysis
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.521
H-Index - 69
eISSN - 1435-8115
pISSN - 1431-9276
DOI - 10.1017/s1431927620000203
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , materials science , femtosecond , field ion microscope , optics , ultraviolet , microscope , photon energy , atomic physics , ion , ionization , laser , optoelectronics , photon , chemistry , physics , organic chemistry
This paper describes initial experimental results from an extreme ultraviolet (EUV) radiation-pulsed atom probe microscope. Femtosecond-pulsed coherent EUV radiation of 29.6 nm wavelength (41.85 eV photon energy), obtained through high harmonic generation in an Ar-filled hollow capillary waveguide, successfully triggered controlled field ion emission from the apex of amorphous SiO2 specimens. The calculated composition is stoichiometric within the error of the measurement and effectively invariant of the specimen base temperature in the range of 25 K to 150 K. Photon energies available in the EUV band are significantly higher than those currently used in the state-of-the-art near-ultraviolet laser-pulsed atom probe, which enables the possibility of additional ionization and desorption pathways. Pulsed coherent EUV light is a new and potential alternative to near-ultraviolet radiation for atom probe tomography.