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Assessing topographic exposure
Author(s) -
Chapman Lee
Publication year - 2000
Publication title -
meteorological applications
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.672
H-Index - 59
eISSN - 1469-8080
pISSN - 1350-4827
DOI - 10.1017/s1350482700001729
Subject(s) - terrain , variable (mathematics) , snow , meteorology , digital elevation model , environmental science , physical geography , remote sensing , computer science , geography , cartography , mathematics , mathematical analysis
Topographic exposure is a variable which represents the degree of shelter afforded to a location. A detailed knowledge of exposure is useful for a wide variety of applications, ranging from the dynamics of drifting snow to the optimal location of wind‐farms. The degree of exposure can be calculated by considering the relative heights and distances of the horizon surrounding the point of study. Numerous approaches have been developed to measure this useful variable, from the early qualitative studies of wind‐shaped trees to Pyatts's quantitative TOPEX assessment. However, these studies have been superseded by the use of computers and in particular the application of digital terrain models. These provide a fast office‐based solution, virtually eliminating the need for fieldwork. Copyright © 2000 Royal Meteorological Society

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