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Different properties of SV channels in root vacuoles from near isogenic Al‐tolerant and Al‐sensitive wheat cultivars
Author(s) -
Wherrett Tim,
Shabala Sergey,
Pottosin Igor
Publication year - 2005
Publication title -
febs letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.593
H-Index - 257
eISSN - 1873-3468
pISSN - 0014-5793
DOI - 10.1016/j.febslet.2005.11.038
Subject(s) - vacuole , cultivar , biophysics , chemistry , locus (genetics) , patch clamp , kinetics , horticulture , biology , biochemistry , gene , cytoplasm , physics , receptor , quantum mechanics
Patch‐clamp experiments revealed that near isogenic ET8 (Al‐tolerant) and ES8 (Al‐sensitive) wheat cultivars differed significantly in slow vacuolar channel properties. Under control conditions, whole vacuole currents displayed faster deactivation in ES8. Application of 1.4 μM vacuolar Al 3+ caused a 20 mV increase in the activation threshold and slowed activation kinetics in ET8 but not in ES8. Channel density was about 30% higher in ES8 than ET8, and was not altered by 24 h aluminium pre‐treatment. However, the activation threshold was reduced in Al‐pre‐treated ES8. Overall, our data suggests that Alt1 locus may control more than the plasma membrane malate channel in wheat.