Open AccessThermal Stability of WB2 and W–B–N Films Deposited by Magnetron Sputtering
Author(s) -
Yanming Liu,
Tong Li,
Feng Liu,
Zhiliang Pei
Publication year - 2019
Publication title -
acta metallurgica sinica (english letters)
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.594
H-Index - 33
eISSN - 2194-1289
pISSN - 1006-7191
DOI - 10.1007/s40195-018-0864-8
Subject(s) - materials science , annealing (glass) , sputter deposition , crystallinity , thermal stability , wafer , microstructure , sputtering , thin film , metallurgy , composite material , analytical chemistry (journal) , nanotechnology , chemical engineering , chemistry , chromatography , engineering
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