Performance of Chemical Vapor Deposited Boron-Doped AlN Thin Film as Thermal Interface Materials for 3-W LED: Thermal and Optical Analysis | Zendy

S. Shanmugan | Zendy; Mutharasu Devarajan | Zendy

Open Access

Performance of Chemical Vapor Deposited Boron-Doped AlN Thin Film as Thermal Interface Materials for 3-W LED: Thermal and Optical Analysis

Author(s) -

S. Shanmugan,

Mutharasu Devarajan

Publication year - 2017

Publication title -

acta metallurgica sinica (english letters)

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.594

H-Index - 33

eISSN - 2194-1289

pISSN - 1006-7191

DOI - 10.1007/s40195-017-0592-5

Subject(s) - materials science , thin film , junction temperature , aluminium , thermal resistance , doping , analytical chemistry (journal) , heat sink , boron , light emitting diode , substrate (aquarium) , diode , grain boundary , chemical vapor deposition , composite material , thermal , optoelectronics , nanotechnology , microstructure , electrical engineering , thermodynamics , chemistry , physics , oceanography , engineering , organic chemistry , chromatography , geology

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