Open AccessIn-situ quantification of the surface roughness for facile fabrications of atomically smooth thin films
Author(s) -
Genhao Liang,
Long Cheng,
Junkun Zha,
Hui Cao,
Jingxian Zhang,
Qixin Liu,
Mingrui Bao,
Jia Liu,
Xiaofang Zhai
Publication year - 2021
Publication title -
nano research
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 2.536
H-Index - 125
eISSN - 1998-0124
pISSN - 1998-0000
DOI - 10.1007/s12274-021-3720-5
Subject(s) - reflection high energy electron diffraction , materials science , thin film , surface finish , electron diffraction , surface roughness , heterojunction , in situ , diffraction , layer (electronics) , reflection (computer programming) , optics , layer by layer , optoelectronics , nanotechnology , composite material , chemistry , physics , organic chemistry , computer science , programming language
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