Open AccessA modified high-temperature vapour deposition technique for fabricating $$\hbox {CH}_{3}\hbox {NH}_{3}\hbox {PbI}_{3}$$ thin films under an ambient atmosphere
Author(s) -
G. Manobalaji,
M Pandiyarajan,
M. Senthilkumar,
S. Moorthy Babu
Publication year - 2019
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/s12034-019-1956-4
Subject(s) - materials science , crystallinity , thin film , chemical vapor deposition , analytical chemistry (journal) , scanning electron microscope , iodide , deposition (geology) , atmosphere (unit) , annealing (glass) , nanotechnology , inorganic chemistry , composite material , organic chemistry , chemistry , paleontology , physics , sediment , biology , thermodynamics
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