z-logo
open-access-imgOpen Access
Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition
Author(s) -
Ashwanth Subramanian,
Nikhil Tiwale,
ChangYong Nam
Publication year - 2018
Publication title -
jom
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.67
H-Index - 107
eISSN - 1543-1851
pISSN - 1047-4838
DOI - 10.1007/s11837-018-3141-4
Subject(s) - microelectronics , materials science , atomic layer deposition , nanotechnology , nanocomposite , chemical vapor deposition , polymer , layer (electronics) , infiltration (hvac) , composite material

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom