Open AccessThermoelectric Properties of Nanocrystalline Silicon Films Prepared by Hot-Wire and Plasma-Enhanced Chemical-Vapor Depositions
Author(s) -
Battogtokh Jugdersuren,
Brian Kearney,
Xiao Liu,
R. M. Stroud,
James C. Culbertson,
Paul A. DeSario,
William Nemeth,
Qi Wang
Publication year - 2019
Publication title -
journal of electronic materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.422
H-Index - 99
eISSN - 1543-186X
pISSN - 0361-5235
DOI - 10.1007/s11664-019-07262-y
Subject(s) - nanocrystalline material , materials science , thermoelectric effect , silicon , plasma , solid state physics , nanocrystalline silicon , chemical vapor deposition , chemical engineering , nanotechnology , metallurgy , crystalline silicon , condensed matter physics , physics , amorphous silicon , engineering , thermodynamics , quantum mechanics
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