Open AccessApplication of MO calculation to plasma-enhanced CVD using organosilicon compounds
Author(s) -
Osamu Takai,
Atsushi Hozumi,
Yasushi Inoue,
Takashi Komori
Publication year - 1997
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02747421
Subject(s) - organosilicon , hexamethyldisiloxane , materials science , contact angle , silane , polytetrafluoroethylene , substrate (aquarium) , chemical engineering , polymer chemistry , plasma , organic chemistry , composite material , chemistry , oceanography , physics , quantum mechanics , engineering , geology
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