Open AccessPreparation and characterization of ultra-thin cobalt silicide for VLSI applications
Author(s) -
S. Kal,
I. Kasko,
H. Ryssel
Publication year - 1995
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02744838
Subject(s) - silicide , materials science , cobalt , thin film , annealing (glass) , silicon , substrate (aquarium) , analytical chemistry (journal) , metallurgy , chemical engineering , nanotechnology , chemistry , chromatography , oceanography , geology , engineering
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom