Open AccessOxygen diffusion and defect mechanism in c-axis textured thin films of YBa2Cu3O7−x by resistivity measurements
Author(s) -
P. Kuppusami,
E. Mohandas,
S. Raju,
V.S. Raghunathan
Publication year - 1997
Publication title -
bulletin of materials science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02744761
Subject(s) - materials science , electrical resistivity and conductivity , diffusion , isothermal process , oxygen , grain boundary diffusion coefficient , thin film , grain boundary , atmospheric temperature range , condensed matter physics , activation energy , analytical chemistry (journal) , crystallography , composite material , thermodynamics , microstructure , nanotechnology , chemistry , engineering , physics , organic chemistry , chromatography , electrical engineering
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