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Self diffusion studies on cobalt thin films
Author(s) -
Jyoti Prasad,
K. V. Reddy
Publication year - 1985
Publication title -
bulletin of materials science
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.35
H-Index - 72
eISSN - 0973-7669
pISSN - 0250-4707
DOI - 10.1007/bf02744253
Subject(s) - materials science , cobalt , diffusion , thin film , grain boundary diffusion coefficient , activation energy , argon , electromigration , surface diffusion , analytical chemistry (journal) , grain boundary , thermodynamics , composite material , nanotechnology , chemistry , atomic physics , metallurgy , microstructure , physics , adsorption , chromatography

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